Valley Design: Edge and Angle Optical Polishing
November 20, 2001
Many optoelectronic manufacturers are beginning to acknowledge that end face polishing can optimize optical performance. Using Valley Design's new technology, which produces an optical quality edge surface finish, improved optical performance can be realized. The company provides edge and angle polishing of various substrate materials including fused silica, silicon, silicon/oxide hybrids, sapphire, pyrex, phosphate glass, LiN and LiTaO3. Typical optical specifications include edge chips < 1 micron; surface finish < 10/5 scratch/dig (< 10 Angstroms); 8 degree angles; no visible scratching under 50X magnification; no visible defects in silica layer under 500X magnification; edge plane orientation +/- .1 degree; oxide rolloff < 1000 Angstroms; and flatness < 3.5 microns per 10 mm.