Veeco Instruments Inc. has introduced another member of its automated atomic force microscope (AFM) family specifically designed to address the semiconductor industry's need for higher-resolution etch depth metrology at smaller feature sizes. The new Dimension X(TM) automated AFM enables chipmakers to measure etch-related structures that are 90 nm and below using a technique that is widely known for its ability to provide exceptional resolution of device features without damaging the wafer.
Our annual R&D Lab Equipment and Instrumentation Directory helps you locate the best suppliers for your needs. This issue also includes articles focused on deformation and tension, materials characterization trends, non-destructive imaging, and more. Check it out!