Asahi Glass Co., Ltd. has succeeded in volume production of a fluorine insulating material featuring relative permittivity of 2.4-2.5, which is among the lowest in the industry. The new product is an organic insulating material that can be applied as interlayer dielectrics for wide-ranging high-frequency devices, including GaAs- and GaN-based compound semiconductors. With high thermostability (at up to 350ºC), the new material can be used in high-temperature processes. The material will make it possible to largely reduce wiring capacitance, raise the operation frequency of devices and reduce power consumption. Asahi developed the material as part of its efforts to build its Electronics & Energy business.
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