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The e-Ion Zapper™ furnace uses a scalable Clean ElectricFlame™ technology platform to provide non-contact, continuous heating in a compact, versatile design. The furnaces are reportedly capable of delivering the rapid heat rate needed for melting, brazing and heat treating. They can be used for applications requiring hardening with extremely small HAZ, because it reportedly allows for a lower residence time than with traditional heating methods such as induction. It allows for rapid processing in air and a number of other gases. Processes can be completed while wire or cable is moving through the e-Ion Plasma™ environment. This type of heating can provide the rapid high temperatures necessary to melt and heat treat.
For more information, visit www.mhi-inc.com.