Morgan Advanced Ceramics (MAC) recently introduced its Diamonex(R) Closed-drift (CD) Source(TM). The Diamonex CD Source is a flexible source ideally suited for a wide range of manufacturing processes that benefit from high flux ions, including substrate cleaning, reactive ion beam etching and ion beam assisted deposition of thin films. It is also a useful tool for reliable high-rate deposition of DLC coatings. The gridless design of the Diamonex CD Source allows a high ion flux, and the substrate will not be contaminated by particles released by the grid.
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