JEOL USA, Inc. has developed new CD-Metrology software that makes it possible to easily measure critical dimensions of semiconductor device structures. Designed for JEOL field emission (FE) SEMs, the new software module allows real-time, precise measurement of line widths and contact holes. In addition, the software module contains flexible and easy-to-use wafer navigation features and data management capability. The company's FE SEMs produce high-resolution images of nanometric features. Using the new software, the SEM operator can measure line width and line pitch, as well as the circumference, area, eccentricity, aspect ratio, and circularity of contact holes or vias.
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