Veeco Instruments Inc. has introduced another member of its automated atomic force microscope (AFM) family specifically designed to address the semiconductor industry's need for higher-resolution etch depth metrology at smaller feature sizes. The new Dimension X(TM) automated AFM enables chipmakers to measure etch-related structures that are 90 nm and below using a technique that is widely known for its ability to provide exceptional resolution of device features without damaging the wafer.
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