AGC to Expand Supply System for EUVL Mask Blanks
AGC began conducting R&D on photomask blanks utilized in EUV lithography technology in 2003.
AGC Asahi Glass recently announced that it has decided to drastically expand a supply system for extreme ultraviolet lithography (EUVL) mask blanks at its AGC Electronics Co., Ltd. group company in 2018. As the sophistication and miniaturization of electronic devices continues to advance, so does demand for faster semiconductor chip calculation speeds, as well as higher capacities and more advanced integration.
The circuit patterns of semiconductor chips must be further miniaturized in order to achieve these goals, yet with currently available optical lithography technology it is theoretically unrealistic to model miniaturized patterns, referred to as “7 nm node.” EUV optical technology is reportedly considered the most plausible technology to create such miniaturized patterns.
AGC began conducting R&D on photomask blanks utilized in EUV lithography technology in 2003. By combining its core technologies (i.e., glass materials, glass processing and coatings), AGC reportedly has the capability to handle every aspect of photomask blanks―from the glass material to film material. Under its AGC plus management policy, the AGC Group has made a commitment to positioning electronics-related business as one of its strategic businesses. AGC intends to continue making aggressive capital investment in EUVL mask blanks, which are expected to see significant growth in demand in the coming years, to contribute to further development of the semiconductor industry.
For more information, visit www.agc.com.